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Stand Alone Multi - Process Tool - FLEX2000

Stand Alone Multi - Process Tool - FLEX2000

FLEX2000- stand alone multi process chamber tool with deposition up to 2" (2002), 4" (2004) and 8" (2008) round wafers. Multiple and co-depositions up to six sources using either sputtering or thermal evaporation , substrate rotation and 400°C substrate temperature standard. State of the art thin film process recipe for various thin films.


Examples of FLEX2008- Six (6) co-sputtering process zones or six (6) co-thermal process zones for vertical upwards deposition up to 8" round wafers and 800°C substrate temperature.


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