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Stand Alone Single Chamber Tool - FLEX1000

Stand Alone Single Chamber Tool - FLEX1000

FLEX1000- stand alone single chamber process tool with deposition up to 2" (1002), 4" (1004) and 8" (1008) round wafers. Any single process of PECVD, HWCVD, ICP and Sputtering can be incorporated, vertical upwards / downwards deposition & 400°C substrate temperature standard. State of the art thin film process recipe for various thin films.


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